The role of vacuum seals in deposition processes
In semiconductor manufacturing, vacuum seals are required for several processes. Industry reports note their specific function in both Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD). For CVD, seals maintain a vacuum in the reaction chamber. This allows a thin film to form uniformly on a wafer. The seals also enable the rotation of the wafer inside the chamber. In PVD processes, the seals perform a similar function. They are used to maintain the controlled environment needed for precise thin film deposition.
Addressing high-temperature operational challenges
A persistent challenge for these components is performance in active gas environments at elevated temperatures. Through research and testing, a new magnetic fluid formulation was developed to minimize outgassing under such conditions. This fluid is paired with an enhanced magnetic fluid seal structure. The combination enables the production of long-lasting seal units for equipment like CVD systems. These units can now be used in applications where seals were previously considered unsuitable.
Application scope and system integration
The use of these seals extends beyond basic semiconductor wafer processing. Documented application areas include single-crystal silicon furnaces, where they preserve vacuum integrity in high-temperature processes. They are also integrated into systems for Flat Panel Display (FPD) production, supporting contamination-free processes for display manufacturing. Within deposition systems, they are often a component of rotating, height-adjustable, and tilt-adjustable substrate holders. This mechanical flexibility is necessary for innovative fabrication of thin films used in solar cells, batteries, and microelectronic devices.
We supply related sealing solutions for these demanding technical environments.