The sealing challenge in CVD and PECVD
Chemical vapor deposition and plasma-enhanced CVD equipment require precise rotary motion to be transmitted into a vacuum chamber. This demands a reliable rotary vacuum seal. Ferrofluid feedthroughs, which use magnetic fluid as the sealing mechanism, are a common solution. They must maintain seal integrity in high vacuums, often better than 10^-9 mbar, and withstand active gas environments at elevated temperatures. Historically, outgassing and fluid degradation at high temperatures limited seal life in certain CVD applications.
A materials-driven solution
Recent development efforts have focused on the fluid itself. Through extensive research and testing, a new magnetic fluid has been created that minimizes outgassing even at high temperatures. This is paired with an enhanced magnetic fluid seal structure. The combination enables the production of long-lasting seal units for CVD equipment, even in applications where seals were previously considered unsuitable. The advanced magnetic fluid ensures reliable performance where high-temperature resistance is required.
Design and application integration
The nut mounting thread body design provides a mechanical interface for integrating these seals into reactor systems. In semiconductor manufacturing, these seals are used in single-crystal silicon furnaces and CVD systems to maintain a leak-free environment. They are also applied in PVD equipment for thin-film deposition and in flat panel display production for contamination-free processes. The design enables maintenance and replacement, which is important for minimizing tool downtime.
We provide a range of feedthroughs and seals designed for these demanding industrial environments.